Electroless Copper on Ta(N)/SiO2/Si with Displacement Activation

Electroless Copper on Ta(N)/SiO2/Si with Displacement Activation

碩士 === 國立清華大學 === 材料科學工程學系 === 88 ===

Bibliographic Details
Main Author: 謝朝全
Other Authors: 林樹均
Format: Others
Language:zh-TW
Published: 2000
Online Access:http://ndltd.ncl.edu.tw/handle/88311271423076326260
id ndltd-TW-088NTHU0159035
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spelling ndltd-TW-088NTHU01590352016-07-08T04:23:16Z http://ndltd.ncl.edu.tw/handle/88311271423076326260 Electroless Copper on Ta(N)/SiO2/Si with Displacement Activation 置換活化法在Ta(N)/SiO2/Si基材上無電鍍銅膜之研究 謝朝全 碩士 國立清華大學 材料科學工程學系 88 林樹均 2000 學位論文 ; thesis 121 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立清華大學 === 材料科學工程學系 === 88 ===
author2 林樹均
author_facet 林樹均
謝朝全
author 謝朝全
spellingShingle 謝朝全
Electroless Copper on Ta(N)/SiO2/Si with Displacement Activation
author_sort 謝朝全
title Electroless Copper on Ta(N)/SiO2/Si with Displacement Activation
title_short Electroless Copper on Ta(N)/SiO2/Si with Displacement Activation
title_full Electroless Copper on Ta(N)/SiO2/Si with Displacement Activation
title_fullStr Electroless Copper on Ta(N)/SiO2/Si with Displacement Activation
title_full_unstemmed Electroless Copper on Ta(N)/SiO2/Si with Displacement Activation
title_sort electroless copper on ta(n)/sio2/si with displacement activation
publishDate 2000
url http://ndltd.ncl.edu.tw/handle/88311271423076326260
work_keys_str_mv AT xiècháoquán electrolesscopperontansio2siwithdisplacementactivation
AT xiècháoquán zhìhuànhuóhuàfǎzàitansio2sijīcáishàngwúdiàndùtóngmózhīyánjiū
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