Electroless Copper on Ta/SiO2/Si with Displacement Activation

Electroless Copper on Ta/SiO2/Si with Displacement Activation

碩士 === 國立清華大學 === 材料科學工程學系 === 88 ===

Bibliographic Details
Main Authors: Min-Hsian Chen, 陳旻賢
Other Authors: Su-Jien Lin
Format: Others
Language:zh-TW
Published: 2000
Online Access:http://ndltd.ncl.edu.tw/handle/11664930287010512928
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spelling ndltd-TW-088NTHU01590462016-07-08T04:23:16Z http://ndltd.ncl.edu.tw/handle/11664930287010512928 Electroless Copper on Ta/SiO2/Si with Displacement Activation 置換活化法在Ta/SiO2/Si基材上無電鍍銅膜之研究 Min-Hsian Chen 陳旻賢 碩士 國立清華大學 材料科學工程學系 88 Su-Jien Lin 林樹均 2000 學位論文 ; thesis 101 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立清華大學 === 材料科學工程學系 === 88 ===
author2 Su-Jien Lin
author_facet Su-Jien Lin
Min-Hsian Chen
陳旻賢
author Min-Hsian Chen
陳旻賢
spellingShingle Min-Hsian Chen
陳旻賢
Electroless Copper on Ta/SiO2/Si with Displacement Activation
author_sort Min-Hsian Chen
title Electroless Copper on Ta/SiO2/Si with Displacement Activation
title_short Electroless Copper on Ta/SiO2/Si with Displacement Activation
title_full Electroless Copper on Ta/SiO2/Si with Displacement Activation
title_fullStr Electroless Copper on Ta/SiO2/Si with Displacement Activation
title_full_unstemmed Electroless Copper on Ta/SiO2/Si with Displacement Activation
title_sort electroless copper on ta/sio2/si with displacement activation
publishDate 2000
url http://ndltd.ncl.edu.tw/handle/11664930287010512928
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AT chénmínxián electrolesscopperontasio2siwithdisplacementactivation
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AT chénmínxián zhìhuànhuóhuàfǎzàitasio2sijīcáishàngwúdiàndùtóngmózhīyánjiū
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