Analysis of Radiation in LPCVD Furnace — Wafer and Furnace
碩士 === 元智大學 === 機械工程研究所 === 88 ===
Main Authors: | Yu-Seng Wang, 王育聖 |
---|---|
Other Authors: | Yur-Tsai Lin |
Format: | Others |
Language: | zh-TW |
Published: |
2000
|
Online Access: | http://ndltd.ncl.edu.tw/handle/59672567043912101257 |
Similar Items
-
Analysis of Radiation in LPCVD Furnace
by: Yi-Hwa Hsieh, et al. -
Analysis of Radiation in LPCVD Furnace - Guard Rings and Holders
by: Chung-Ming Wang, et al.
Published: (1999) -
Modeling and Control of Wafer Temperature and Thickness in a LPCVD Furnace
by: Chen Hsiang Huang, et al.
Published: (2010) -
Construction of a Prediction Model of Wafer Temperature and Film Thickness in a Multiwafer LPCVD Furnace
by: Young Soung Cheng, et al.
Published: (2011) -
Practical Improvement of the Pressure Control System for the LPCVD Furnace
by: Yi Chuan Chen, et al.
Published: (2013)