Design, Fabrication, and Applications of Phase Masks
碩士 === 國立臺灣大學 === 光電工程學研究所 === 89 === The field modulation can be simulated by either using a simple amplitude transmittance theory or, more accurately, by using the rigorous coupled wave theory to calculate diffracted intensity distribution as grating parameters are varied. The results o...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2001
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/53078289997932722044 |
| Summary: | 碩士 === 國立臺灣大學 === 光電工程學研究所 === 89 === The field modulation can be simulated by either using a simple amplitude transmittance theory or, more accurately, by using the rigorous coupled wave theory to calculate diffracted intensity distribution as grating parameters are varied. The results of studying the effects of a non-ideal phase mask and a non-ideal light source reveals the reduction of zero-order intensity can be set as a goal for the fabrication of phase masks.
Interferometric lithography and reactive ion etching are used to fabricate phase masks, and Taguchi method is used to optimize the processing parameters. With the optimized conditions, we obtain a phase mask of 0.5 μm period and 8% zero-order diffraction efficiency. The mask is used to produce a photoresist pattern with halved period.
Applications of phase masks to fiber grating fabrication and sub-micron grating fabrication are also discussed. Phase masks with optimized 1.08μm period and 5% zero-order diffraction efficiency are shown capable of fabricating fiber Bragg gratings with 7dB transmission loss at 1.563μm wavelength.
|
|---|