The Influence of Native Oxide in the Interfacial Reactions of Nb/Si Systems

碩士 === 國立臺灣科技大學 === 機械工程系 === 89 === Abstract The purpose of this study was to investigate the interface reaction between Nb and Si substrates after Nb was deposited on Si substrate by sputtering. Si substrates cleaned with (or without) dipping in a diluted HF solution (HF:H2O=1:50) wer...

Full description

Bibliographic Details
Main Authors: Guo-Ruei Huang, 黃國瑞
Other Authors: 鄭偉鈞
Format: Others
Language:zh-TW
Published: 2001
Online Access:http://ndltd.ncl.edu.tw/handle/53983809612951262530

Similar Items