Positive-working Aqueous Base Developable Photosensitive Polyimides
碩士 === 國立成功大學 === 材料科學及工程學系碩博士班 === 90 === Abstract Positive working aqueous base developable photosensitive polyimide precursors based on polyamic esters bearing phenolic hydroxyl groups and diazonaphthoquinone (DNQ) photosensitive compounds have been developed. The polyamic esters were prepared fr...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/6qsyyj |
| Summary: | 碩士 === 國立成功大學 === 材料科學及工程學系碩博士班 === 90 === Abstract
Positive working aqueous base developable photosensitive polyimide precursors based on polyamic esters bearing phenolic hydroxyl groups and diazonaphthoquinone (DNQ) photosensitive compounds have been developed. The polyamic esters were prepared from a direct polymerization of 2，2’-bis-(3-amino-4-hydroxyphenyl) hexafluoro propane (BisAPAF) and bis(n-butyl) ester of pyromellitic dianhydride (PMDA) or 4,4-Oxydiphthalic anhydride(ODPA)in the presence of phenylphosphonic dichloride as an activator. The inherent viscosity of the precursor polymer was 0.23 dL/g. The structures of the precursor polymer and the fully cyclized polymer were characterized by FTIR and 1H-NMR. The photosensitive polyimide precursor from the uncapped polyamic ester containing 25phr(parts per hundred resin) PIC-3 showed a sensitivity of 150 mJ/cm2 and a contrast of 1.65 in a 3μm film with a 1.25 wt % tetramethylammonium hydroxide (TMAH) developer. A pattern with a resolution of 10μm was obtained from this composition. In order to improve the dark film loss, the polyamic esters were capped with DNQ. The photosensitive polyimide precursor from 25% DNQ capped BisAPAF-PMDA-n-butyl polyamic ester containing 25phr PIC-3 showed a sensitivity of 176 mJ/cm2 and a contrast of 1.68 in a 3μm film under the same lithographic conditions. The 25% DNQ capped BisAPAF-ODPA- n-butyl polyamic ester containing 25phr PIC-3 showed a sensitivity of 185 mJ/cm2 and a contrast of 1.02. Both of DNQ capped polyamic esters gave a pattern with a resolution of 5μm and had a much less dark film loss.
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