Design, fabrication and testing ofhigh-numerical-aperture GaN microlens
碩士 === 國立中央大學 === 物理研究所 === 90 === Abstract Plano-convex diffractive microlenses were fabricated in GaN-based materials with a gray-level mask for the first time. The surface relief of the gray-level diffractive microlens on photoresist was transferred onto GaN by inductively coupled plasma etching...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/89601886566185509760 |
| Summary: | 碩士 === 國立中央大學 === 物理研究所 === 90 === Abstract
Plano-convex diffractive microlenses were fabricated in GaN-based materials with a gray-level mask for the first time. The surface relief of the gray-level diffractive microlens on photoresist was transferred onto GaN by inductively coupled plasma etching technique. The microlenses were characterized with a blue laser diode emitting at 405nm. The focal length of the GaN diffractive microlens is 14.5cm. The potential of the realization of the high-numerical-aperture diffractive microlens in GaN with gray-level mask is discussed.
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