Patterning Artificial Defects onto Macroporous Structure

• Main Authors: Tsung-Jung Kuo, 郭聰榮
• Other Authors: Chia-Chun Chen
• Format: Others
• Language: zh-TW
• Published: 2002
• Online Access: http://ndltd.ncl.edu.tw/handle/62785152364018933356

碩士 === 國立臺灣師範大學 === 化學研究所 === 90 === We prepare close packed colloidal arrays of 0.5 mm silica assembled on an indium tin oxide (ITO) substrate surface using sedimentation. Through systematic studies on current density, deposition time, concentrations of electrolytes, solvents and temperatures etc., we are able to fabricate the films of four different semiconductors, ZnSe, CdSe, CdTe, GaAs, onto the silica arrays by electrochemical depositions. Following by removal of silica, 3D macroporous structures made from those semiconductors are built, and the structure exhibit excellent 3D periodicity, uniformity and also optical properties. Following by the pattern of artificial defects onto ITO substrate, we fabricate microchannels that have been created artificially using lithography method. After sedimentation silica arrays assembled on ITO substrate, it can be used as a template for the electrochemical depositions of various semiconductors. The microchannels inside a macroporous structure were fabricated after the template was immersed in HF solution. The microchannels have a width and depth of 2~4 mm and a rectangularity.