Optical Monitoring in magnetron sputtering

• Main Authors: Hung-Sen Wu, 吳鴻森
• Other Authors: Cheng-Chung Lee
• Format: Others
• Language: zh-TW
• Published: 2003
• Online Access: http://ndltd.ncl.edu.tw/handle/30977941563505720964

碩士 === 國立中央大學 === 光電科學研究所 === 91 === Magnetron Sputtering has been widely used in the process of preparing large area coating. Because of the high and steady sputtering rate and good uniformity of thin films, magnetron sputtering must be the main stream of the coating methods in the future. It is very important to control the thickness of the film. When the film thickness is under control, we can easily achieve the goal of any film design, especially DWDM thin film filters, which have severe thickness accuracy. The main subject in this study is to construct an optical monitoring system in magnetron sputtering system. Using Overshoot Turning Point Monitoring as the monitoring method, we decrease the thickness errors at modified ceased point. We can easily change monitoring wavelength in order to reduce the thickness errors. We prepare a series of film designs, including single layer film and multi-layer films. We got success in the thickness control of coating narrow band-pass filter. After experiments, we make analysis of spectrum from original design and experiment. We find out the factors, which affect the accuracy of monitoring (refractive index of thin films, substrate rotating, and steady signal).