Optical Monitoring in magnetron sputtering
碩士 === 國立中央大學 === 光電科學研究所 === 91 === Magnetron Sputtering has been widely used in the process of preparing large area coating. Because of the high and steady sputtering rate and good uniformity of thin films, magnetron sputtering must be the main stream of the coating methods in the future. It is...
Main Authors: | Hung-Sen Wu, 吳鴻森 |
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Other Authors: | Cheng-Chung Lee |
Format: | Others |
Language: | zh-TW |
Published: |
2003
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Online Access: | http://ndltd.ncl.edu.tw/handle/30977941563505720964 |
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