Characteristics and Plasma effects on MOSFET Devices with HfOxNyGate Dielectrics

碩士 === 國立清華大學 === 工程與系統科學系 === 91 ===

Bibliographic Details
Main Authors:	Jack P.H. Tsai, 蔡秉宏
Other Authors:	S.H. Li
Format:	Others
Language:	zh-TW
Published:	2003
Online Access:	http://ndltd.ncl.edu.tw/handle/40813786199477234900

id	ndltd-TW-091NTHU0593072
record_format	oai_dc
spelling	ndltd-TW-091NTHU05930722016-06-22T04:26:25Z http://ndltd.ncl.edu.tw/handle/40813786199477234900 Characteristics and Plasma effects on MOSFET Devices with HfOxNyGate Dielectrics 鉿氧氮閘介電層金氧半電晶體特性及其電漿效應研究 Jack P.H. Tsai 蔡秉宏碩士國立清華大學工程與系統科學系 91 S.H. Li Kuei-Shu Chang-Liao 李四海張廖貴術 2003 學位論文 ; thesis 0 zh-TW
collection	NDLTD
language	zh-TW
format	Others
sources	NDLTD
description	碩士 === 國立清華大學 === 工程與系統科學系 === 91 ===
author2	S.H. Li
author_facet	S.H. Li Jack P.H. Tsai 蔡秉宏
author	Jack P.H. Tsai 蔡秉宏
spellingShingle	Jack P.H. Tsai 蔡秉宏 Characteristics and Plasma effects on MOSFET Devices with HfOxNyGate Dielectrics
author_sort	Jack P.H. Tsai
title	Characteristics and Plasma effects on MOSFET Devices with HfOxNyGate Dielectrics
title_short	Characteristics and Plasma effects on MOSFET Devices with HfOxNyGate Dielectrics
title_full	Characteristics and Plasma effects on MOSFET Devices with HfOxNyGate Dielectrics
title_fullStr	Characteristics and Plasma effects on MOSFET Devices with HfOxNyGate Dielectrics
title_full_unstemmed	Characteristics and Plasma effects on MOSFET Devices with HfOxNyGate Dielectrics
title_sort	characteristics and plasma effects on mosfet devices with hfoxnygate dielectrics
publishDate	2003
url	http://ndltd.ncl.edu.tw/handle/40813786199477234900
work_keys_str_mv	AT jackphtsai characteristicsandplasmaeffectsonmosfetdeviceswithhfoxnygatedielectrics AT càibǐnghóng characteristicsandplasmaeffectsonmosfetdeviceswithhfoxnygatedielectrics AT jackphtsai jiāyǎngdànzhájièdiàncéngjīnyǎngbàndiànjīngtǐtèxìngjíqídiànjiāngxiàoyīngyánjiū AT càibǐnghóng jiāyǎngdànzhájièdiàncéngjīnyǎngbàndiànjīngtǐtèxìngjíqídiànjiāngxiàoyīngyánjiū
_version_	1718319509663645696

Characteristics and Plasma effects on MOSFET Devices with HfOxNyGate Dielectrics

Similar Items