Characteristics and Plasma effects on MOSFET Devices with HfOxNyGate Dielectrics
碩士 === 國立清華大學 === 工程與系統科學系 === 91 ===
Main Authors: | Jack P.H. Tsai, 蔡秉宏 |
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Other Authors: | S.H. Li |
Format: | Others |
Language: | zh-TW |
Published: |
2003
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Online Access: | http://ndltd.ncl.edu.tw/handle/40813786199477234900 |
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