The Effect of Surface Stress on the Configurational Equilibrium of voids

碩士 === 國立臺灣大學 === 應用力學研究所 === 91 === Semi-conductor industry has entered sub-micro age with the progress of ULSI’s technology. Since aluminum interconnects are widely applied to semi-conductor devices, its reliability has great influence on lifetime of product devices. From...

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Bibliographic Details
Main Authors: Liang-Jiun MA, 馬良駿
Other Authors: Chao-Hsun Chen
Format: Others
Language:zh-TW
Published: 2002
Online Access:http://ndltd.ncl.edu.tw/handle/75715747212060906524

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