The Effect of Surface Stress on the Configurational Equilibrium of voids
碩士 === 國立臺灣大學 === 應用力學研究所 === 91 === Semi-conductor industry has entered sub-micro age with the progress of ULSI’s technology. Since aluminum interconnects are widely applied to semi-conductor devices, its reliability has great influence on lifetime of product devices. From...
Main Authors: | Liang-Jiun MA, 馬良駿 |
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Other Authors: | Chao-Hsun Chen |
Format: | Others |
Language: | zh-TW |
Published: |
2002
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Online Access: | http://ndltd.ncl.edu.tw/handle/75715747212060906524 |
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