Reaction Mechanism studies of Organic Additives on Copper Plating for IC substrate Micro Via-Hole Filling

碩士 === 國立雲林科技大學 === 工業化學與災害防治研究所 === 91 === Traditional process of wafer and IC packaging substrate manufacture has encountered severe challenge with modern electronic products becoming smaller and powerful. The most crucial challenge is the trenches and blind-via holes filled by copper plating. Thi...

Full description

Bibliographic Details
Main Authors: Her-Shu Huang, 黃河樹
Other Authors: Wei-Ping Dow
Format: Others
Language:zh-TW
Published: 2003
Online Access:http://ndltd.ncl.edu.tw/handle/85168126880669576802

Similar Items