2-D Modeling and Plasma Diagnostics of Inductive-Coupled Ar and CF4 Plasma Reactor
碩士 === 中原大學 === 化學工程研究所 === 92 === In this study, a two-dimensional planar inductively coupled plasma reactor model was established to calculate the variations of the electron, ion, and radical concentration of Ar and CF4 plasma at the substrate surface as a function of the rf power, pressure, coil...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2004
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| Online Access: | http://ndltd.ncl.edu.tw/handle/66rpub |