The thickness of organic films and addition of LiF on device performance of non-volatile organic bistable memory

碩士 === 國立東華大學 === 材料科學與工程學系 === 92 === Abstract As compared with inorganic semiconducting materials, the advantages of non-volatile organic bistable memory include simple device structure, simple fabrication process, high integration ability on flexible substrate, and low manufacturing c...

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Bibliographic Details
Main Authors: Ching-Shuen Hsu, 許清舜
Other Authors: Hsi-Chiu Wang
Format: Others
Language:zh-TW
Published: 2004
Online Access:http://ndltd.ncl.edu.tw/handle/82762289068176745317
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Summary:碩士 === 國立東華大學 === 材料科學與工程學系 === 92 === Abstract As compared with inorganic semiconducting materials, the advantages of non-volatile organic bistable memory include simple device structure, simple fabrication process, high integration ability on flexible substrate, and low manufacturing cost in the future, since the organic semiconductor materials have lower melting point and process temperature. In this study, the effects of organic bistable memory device with different layer thicknesses of organic film and various organic materials are discussed. With an additional LiF layer in device is also discussed in this work about the device stability of organic bistable memory. The device made by thermal evaporation method comprises of stacking 5-layer organic and metallic films structure. The organic film of AIDCN with a thickness of 30nm shows a good device performance on the on-off ratio (~107). However, the threshold voltage of a device with AIDCN is about 2.5V, which is larger than the threshold voltage of a device with Alq3, ~1.3V. An additional LiF film incorporated into the stacked device can increase the threshold and read voltage, and improve on-off ratio and stability of a device. The results in this study show the probable parameters, which could be used to design the various types of non-volatile organic memories for the future market. The materials of AIDCN and Alq3 can be applied to the devices with high on-off ratio and low the threshold voltage respectively. An additional LiF layer can be applied to the device with higher on-off ratio and stability.