The Study on Formulation of Photo-sensitive Resin with Carbon Black Nano-particles

• Main Authors: Wei-Ting Yeh, 葉威廷
• Other Authors: Wen-Tung Cheng
• Format: Others
• Language: zh-TW
• Published: 2005
• Online Access: http://ndltd.ncl.edu.tw/handle/74452309612576097935

碩士 === 國立中興大學 === 化學工程學系 === 93 === The next generation TFT-LCD is gradually developing for light, full-color and mobile display. Therefore, the color filter that plays a key element of TFT-LCD is to be improved for ultra high resolution and precision pattern by using nano-technology. That is it needs to decrease the distance between pixels and to increase aperture ratio. As a result, it’s importance research to develop new material with higher optical density, lower conductivity, and free environmental problem for finer black matrix. With the property of larger specific surface area, lower content of the carbon black nano-particle in thinner polymeric film can show an excellent absorption and high shield effect to the visible light. In addition, as the carbon black nano-powders are well dispersed, the conductive path may be significantly reduced to form high electrical resistance in polymeric matrix. In this work, carbon black with the mean sizes of 15nm and 24nm, which are trademarked by CARBOT M-900 and Mogul L, respectively, were added into co-solvent composed from PGMEA（propylene glycol monomethyl ether acetate） and normal butyl alcohol decreasing surface tension to enhance the permeability of agglomerated carbon black, and then polymeric dispersant was used to stable carbon black nano-particles in the solution after dispersing process made on the mill method. Finally, the paste with carbon black nano-particles was blended with multi-functional group acrylic resin, reactive monomer DPHA（Dipentaerythritol pena-/hexa-acrylate）containing 5 functional group as well as high extinction coefficient of photo-initiator (CGI-242 and I369) to form high performance photo-resist with carbon black nano-particles for black matrix of color filter. As shown in the results from the photolithography evaluation, 10m resolution of patter may be fabricated by the photo-resist with both 14.3% Mogul L and 10.9wt% M-900 carbon blacks for black matrix with optical density and electrical resistance at levels of 3.25/m and 1012.4Ω/□ as well as 3.16/m and 109.6Ω/□, respectively, in this study.