Numerical analysis of the retention behavior in nitride storage flash memory

碩士 === 國立交通大學 === 電子工程系所 === 93 === The bottom oxide thickness induced the charge loss blocking effect for a SONOS type flash memory is investigated. Utilizing a numerical analysis based on a multiple trapping model for solving the Shockley-Read-Hall (SRH) rate equations, the more accurate expressio...

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Bibliographic Details
Main Authors: Hsu Chih-Wei, 許智維
Other Authors: Tahui Wang
Format: Others
Language:en_US
Published: 2005
Online Access:http://ndltd.ncl.edu.tw/handle/86474805502454286236