Study on low voltage electrodeposition of DLC films

• Main Authors: Yi-nan Lin, 林益楠
• Other Authors: none
• Format: Others
• Language: zh-TW
• Published: 2005
• Online Access: http://ndltd.ncl.edu.tw/handle/92201065243410134090

碩士 === 國立中山大學 === 電機工程學系研究所 === 93 === In the early years, DLC films was deposited at high voltage applied by electrochemical method. In this study, DLC film was deposited alternatively at low voltage applied using electrodeposition. The ITO glass substrate was used as the cathode, and graphite sheet was the anode. The electrolyte is a mixture of acetic acid with DI water. The applied voltage was mere 2.1 volt during the electrochemical process. For investigating the structure of deposited films, the deposited DLC layers were characterized by Fourier transform infrared (FTIR), Scanning electron microscope (SEM) and Raman spectrometer. The SEM results show that the DLC films have a rough surface and their roughness increased with longer in deposition time as well as raise applied voltage. The Raman spectra shows distinct broad characteristic peaks at ~ 1336 cm-1 (D-peak) and ~ 1601 cm-1 (G-peak), which indicate the disordered graphite-like structure and the graphite structure, respectively. While the bond angles occur to bend or the increase the content of sp3 bonds in DLC film, both the G-peak and the D-peak shift to the lower wave numbers. Peaks at ~ 2956 and ~ 2917 cm-1 found in FTIR measurement were used to recognize the existence of sp3 and sp2 combined carbon atoms in the films. Based on above results, it could conclude that the DLC film could be prepared by electrodeposition under low applied voltage.