Characteristics of Transparent Conducting ZnO:Al Thin Films Prepared by Reactive RF Magnetron Sputtering
碩士 === 正修科技大學 === 電子工程研究所 === 94 === In this study, the reactive rf magnetron sputtering was used to deposit Aluminum-doped zinc oxide (AZO) thin films on corning 7059 glass substrate at room temperature. The thermal treatment procedure was carried out to improve the electrical characteristics and o...
Main Authors: | Tai-Chao Kuo, 郭泰照 |
---|---|
Other Authors: | 王納富 |
Format: | Others |
Language: | zh-TW |
Published: |
2006
|
Online Access: | http://ndltd.ncl.edu.tw/handle/39267349818850566609 |
Similar Items
-
The study of transparent conductive ZnO:Al thin films prepared by RF reactive magnetron sputtering
by: Chang, Jung-Fang, et al.
Published: (1997) -
Characterizations of Transparent Conductive ZnO:Al (AZO) Thin Films by RF Magnetron Sputtering
by: Yu-Chieh Yu, et al.
Published: (2010) -
Growth characteristics and properties of transparent and conductive ZnO:Al films by reactive RF magnetron sputtering
by: Jung-Fang Chang, et al.
Published: (2001) -
Characterization of Transparent Conductive ZnO:Al (AZO) Thin Films by DC Magnetron Sputtering
by: SunPinWang, et al.
Published: (2009) -
Growth of transparent conductive ZnO:Al thin film on flexible substrates by DC Magnetron Sputtering
by: Yi-Syuan Jhao, et al.
Published: (2007)