Electrical and XRD Characterization of C60 Films

• Main Authors: Li-Tai Cheng, 鄭力太
• Other Authors: Kuan-Cheng Chiu
• Format: Others
• Language: zh-TW
• Published: 2006
• Online Access: http://ndltd.ncl.edu.tw/handle/32316703926207436759

碩士 === 中原大學 === 應用物理研究所 === 94 === This work examines the properties of C60 polycrystalline films by physical vapor deposition in a vertical chamber. By varying the substrate temperature Tsub and source temperature Tsou, the as-deposited films are grouped into two types, according to the peaks of X-ray diffraction (XRD). Moreover, the turn-on voltage of C60/Au heterojunction lies in the range 0.15-0.25 V. For capacitance measurement, we have observed that the capacitance was varied due to the applied voltage (forward bias or reverse bias).