Effect of processing parameters for black matrix withmultiple chromium related layers on its properties in color filter application

• Main Authors: ChenChin-Lung, 陳進隆
• Other Authors: Shang-Chou Chang
• Format: Others
• Published: 2006
• Online Access: http://ndltd.ncl.edu.tw/handle/74361030693521114992

碩士 === 崑山科技大學 === 電機工程研究所 === 94 === The function of black matrix (BM) used in color filter is to avoid color interference. The usual needs for BM pattern are high light optical density and fine line width. Most material Most BM used material is chromium (Cr) and its compound combination in today display market. As compared to other metal, Cr has low light reflectivity and good adhesion with glass. Multilayered Cr/Cr compound films are usually produced by sputtering method. As compared to other metal, Cr has low optical reflectivity and good adhesion with glass. Furthermore, only 0.15μm film thickness of Cr can exhibit high optical density. The etching rates with respect to Cr and CrOx are usually different during BM processing. Undercuts are therefore produced. This decreases production yield and color quality in color filter application. Multilayered Cr/Cr compound films were first annealed in hydrogen atmosphere followed by studying etching and optical properties of the films in this work. The experimental result shows after hydrogen annealing, optical density does not change much; vertical and lateral etching rates are decreased. Lateral etching rate is decreased about 13.5~13.8%. The annealing process seems improving undercut effect.