| Summary: | 碩士 === 國立交通大學 === 工學院碩士在職專班精密與自動化工程學程 === 94 === The development of the Liquid Crystal Display (LCD) is moving toward larger dimension and higher resolution. While the LCD increases its size, there remains many technical obstacles remained to be solved. For example, stitching line between exposures, alignment errors will cause non-uniform display (Shot Mura) and influence the quality of TFT-LCD display.
The aim of the thesis is to study the influence of the shot mura by mosaic pattern design. We adopt the mosaic pattern at stitching exposure zone, namely: 1. Array side mosaic pattern arrangement, 2. Relation of array and color filter stitching line 3. Influence of the shot mura of alignment precision. From the experiment results, we obtain the conclusion as follows: 1. Different mosaic pattern for each mask 2. Color filter and the array stitching line must overlap 3. Alignment precision shouldn’t be over 1.5 um. That will achieve better LCD display quality then conventional stitching exposure.
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