The Study of Lithium Niobate Thin Films by RF Sputtering Method

博士 === 國立中央大學 === 光電科學研究所 === 94 === Abstract Very high quality LiNbO3 films were deposited on both silicon and quartz substrates for the applications of surface acoustic wave and optical waveguide by RF magnetron sputtering. We have investigated the dependence of the surface morphology, texture, cr...

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Main Authors: Fu-Tsai Hwang, 黃富財
Other Authors: none
Format: Others
Language:zh-TW
Published: 2006
Online Access:http://ndltd.ncl.edu.tw/handle/35494896255427060073
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spelling ndltd-TW-094NCU056140622015-10-13T16:31:54Z http://ndltd.ncl.edu.tw/handle/35494896255427060073 The Study of Lithium Niobate Thin Films by RF Sputtering Method 以RF濺鍍法沉積鈮酸鋰薄膜之研究 Fu-Tsai Hwang 黃富財 博士 國立中央大學 光電科學研究所 94 Abstract Very high quality LiNbO3 films were deposited on both silicon and quartz substrates for the applications of surface acoustic wave and optical waveguide by RF magnetron sputtering. We have investigated the dependence of the surface morphology, texture, crystallinity, thickness, refractive index, extinction coefficient properties with the sputtering parameters and annealing process. The optimum deposition temperature was measured by differential thermal analysis. The crystallinity was examined by x-ray and low angle x-ray diffractometer (XRD). The roughness of LiNbO3 thin films was examined by atomic force microscopy (AFM). AFM and XRD measurements were used to investigate the mechanisms of the variation in the surface morphology and crystallinity of LiNbO3 thin films.The optimum deposition temperature was found to be about 575℃. In this investigation the optimum ratio of the mass flow Ar/O2 was found to be about 1:1. Simultaneously, the RF power necessary for texture was found to be about 100W. The thickness, refractive index and extinction coefficient of LiNbO3 thin films were examined by ellipsometer. We have found the refractive index (n) is 2.2 (at 632.8nm), which is identical with the parameter of LiNbO3 ever reported. At the same time, the extinction coefficient of LiNbO3 thin films approachs to zero , represents that these thin films are suitable for optical waveguides. none 李清庭張正陽 2006 學位論文 ; thesis 115 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 博士 === 國立中央大學 === 光電科學研究所 === 94 === Abstract Very high quality LiNbO3 films were deposited on both silicon and quartz substrates for the applications of surface acoustic wave and optical waveguide by RF magnetron sputtering. We have investigated the dependence of the surface morphology, texture, crystallinity, thickness, refractive index, extinction coefficient properties with the sputtering parameters and annealing process. The optimum deposition temperature was measured by differential thermal analysis. The crystallinity was examined by x-ray and low angle x-ray diffractometer (XRD). The roughness of LiNbO3 thin films was examined by atomic force microscopy (AFM). AFM and XRD measurements were used to investigate the mechanisms of the variation in the surface morphology and crystallinity of LiNbO3 thin films.The optimum deposition temperature was found to be about 575℃. In this investigation the optimum ratio of the mass flow Ar/O2 was found to be about 1:1. Simultaneously, the RF power necessary for texture was found to be about 100W. The thickness, refractive index and extinction coefficient of LiNbO3 thin films were examined by ellipsometer. We have found the refractive index (n) is 2.2 (at 632.8nm), which is identical with the parameter of LiNbO3 ever reported. At the same time, the extinction coefficient of LiNbO3 thin films approachs to zero , represents that these thin films are suitable for optical waveguides.
author2 none
author_facet none
Fu-Tsai Hwang
黃富財
author Fu-Tsai Hwang
黃富財
spellingShingle Fu-Tsai Hwang
黃富財
The Study of Lithium Niobate Thin Films by RF Sputtering Method
author_sort Fu-Tsai Hwang
title The Study of Lithium Niobate Thin Films by RF Sputtering Method
title_short The Study of Lithium Niobate Thin Films by RF Sputtering Method
title_full The Study of Lithium Niobate Thin Films by RF Sputtering Method
title_fullStr The Study of Lithium Niobate Thin Films by RF Sputtering Method
title_full_unstemmed The Study of Lithium Niobate Thin Films by RF Sputtering Method
title_sort study of lithium niobate thin films by rf sputtering method
publishDate 2006
url http://ndltd.ncl.edu.tw/handle/35494896255427060073
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