A Study of Nanocrystakkine Zr(N,O) Thin Films Deposited by Ion Plating
碩士 === 國立清華大學 === 工程與系統科學系 === 94 === Nanocrystalline Zr(N,O) thin films were deposited on p-type (111) Si wafers using hollow cathode discharge ion-plating (HCD-IP) system. The effect of oxygen flow rate (ranging from 0 to 8 sccm) on the composition, structure and properties of the Zr(N,O) thin fil...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2005
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/12414867846633047669 |