A Study of Nanocrystakkine Zr(N,O) Thin Films Deposited by Ion Plating
碩士 === 國立清華大學 === 工程與系統科學系 === 94 === Nanocrystalline Zr(N,O) thin films were deposited on p-type (111) Si wafers using hollow cathode discharge ion-plating (HCD-IP) system. The effect of oxygen flow rate (ranging from 0 to 8 sccm) on the composition, structure and properties of the Zr(N,O) thin fil...
Main Authors: | Kai-Hsuan Chang, 張楷弦 |
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Other Authors: | Jia-Hong Huang |
Format: | Others |
Language: | en_US |
Published: |
2005
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Online Access: | http://ndltd.ncl.edu.tw/handle/12414867846633047669 |
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