| Summary: | 碩士 === 國立臺灣大學 === 生物產業機電工程學研究所 === 94 === Nanoimprint lithography technology (NIL) has emerged as one of the most promising technologies for high-throughput nanoscale patterning. It consists in replicating the patterns of template fabricated by electron beam lithography and reactive ion etching, by deforming physically a cross-linked polymer coated on substrate.
In this research, quartz is selected as the template material because of its transparency and high hardness. First, a 100nm thick Cr as a conducting layer is deposited on quartz template by thermal evaporation. Then, a 380nm thick positive photo-resist ZEP-520A is spin coated on Cr layer.
After E-beam lithography, the quartz template is fabricated by high density plasma reactive ion etch. Afterwards, the surface of the quartz template is treated by Tridecafluoro-1,1,2,2,tetrahydrooctyl trichlorosilane to form a self-assembling release layer.
Finally, photo-curing NIL is accomplished by pressing the surface-treated template to Si-substrate coated with cross-linked polymer mr-L 6000.3Xpe.
This research has successfully defined 60~100nm width resist features. Features of 80~120nm are resolved on the mode and transferred to the polymer after imprinting.
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