Fabrication and Surface Treatment of Quartz Template for Photo-Curing Nanoimprint Lithography
碩士 === 國立臺灣大學 === 生物產業機電工程學研究所 === 94 === Nanoimprint lithography technology (NIL) has emerged as one of the most promising technologies for high-throughput nanoscale patterning. It consists in replicating the patterns of template fabricated by electron beam lithography and reactive ion etching, by...
Main Authors: | , |
---|---|
Other Authors: | |
Format: | Others |
Language: | zh-TW |
Published: |
2006
|
Online Access: | http://ndltd.ncl.edu.tw/handle/50043462545556374696 |
id |
ndltd-TW-094NTU05415003 |
---|---|
record_format |
oai_dc |
spelling |
ndltd-TW-094NTU054150032015-12-16T04:38:20Z http://ndltd.ncl.edu.tw/handle/50043462545556374696 Fabrication and Surface Treatment of Quartz Template for Photo-Curing Nanoimprint Lithography 光固化型奈米壓印-石英母模製備及表面處理之研究 Kuan-Lin Li 李冠霖 碩士 國立臺灣大學 生物產業機電工程學研究所 94 Nanoimprint lithography technology (NIL) has emerged as one of the most promising technologies for high-throughput nanoscale patterning. It consists in replicating the patterns of template fabricated by electron beam lithography and reactive ion etching, by deforming physically a cross-linked polymer coated on substrate. In this research, quartz is selected as the template material because of its transparency and high hardness. First, a 100nm thick Cr as a conducting layer is deposited on quartz template by thermal evaporation. Then, a 380nm thick positive photo-resist ZEP-520A is spin coated on Cr layer. After E-beam lithography, the quartz template is fabricated by high density plasma reactive ion etch. Afterwards, the surface of the quartz template is treated by Tridecafluoro-1,1,2,2,tetrahydrooctyl trichlorosilane to form a self-assembling release layer. Finally, photo-curing NIL is accomplished by pressing the surface-treated template to Si-substrate coated with cross-linked polymer mr-L 6000.3Xpe. This research has successfully defined 60~100nm width resist features. Features of 80~120nm are resolved on the mode and transferred to the polymer after imprinting. 謝志誠 2006 學位論文 ; thesis 90 zh-TW |
collection |
NDLTD |
language |
zh-TW |
format |
Others
|
sources |
NDLTD |
description |
碩士 === 國立臺灣大學 === 生物產業機電工程學研究所 === 94 === Nanoimprint lithography technology (NIL) has emerged as one of the most promising technologies for high-throughput nanoscale patterning. It consists in replicating the patterns of template fabricated by electron beam lithography and reactive ion etching, by deforming physically a cross-linked polymer coated on substrate.
In this research, quartz is selected as the template material because of its transparency and high hardness. First, a 100nm thick Cr as a conducting layer is deposited on quartz template by thermal evaporation. Then, a 380nm thick positive photo-resist ZEP-520A is spin coated on Cr layer.
After E-beam lithography, the quartz template is fabricated by high density plasma reactive ion etch. Afterwards, the surface of the quartz template is treated by Tridecafluoro-1,1,2,2,tetrahydrooctyl trichlorosilane to form a self-assembling release layer.
Finally, photo-curing NIL is accomplished by pressing the surface-treated template to Si-substrate coated with cross-linked polymer mr-L 6000.3Xpe.
This research has successfully defined 60~100nm width resist features. Features of 80~120nm are resolved on the mode and transferred to the polymer after imprinting.
|
author2 |
謝志誠 |
author_facet |
謝志誠 Kuan-Lin Li 李冠霖 |
author |
Kuan-Lin Li 李冠霖 |
spellingShingle |
Kuan-Lin Li 李冠霖 Fabrication and Surface Treatment of Quartz Template for Photo-Curing Nanoimprint Lithography |
author_sort |
Kuan-Lin Li |
title |
Fabrication and Surface Treatment of Quartz Template for Photo-Curing Nanoimprint Lithography |
title_short |
Fabrication and Surface Treatment of Quartz Template for Photo-Curing Nanoimprint Lithography |
title_full |
Fabrication and Surface Treatment of Quartz Template for Photo-Curing Nanoimprint Lithography |
title_fullStr |
Fabrication and Surface Treatment of Quartz Template for Photo-Curing Nanoimprint Lithography |
title_full_unstemmed |
Fabrication and Surface Treatment of Quartz Template for Photo-Curing Nanoimprint Lithography |
title_sort |
fabrication and surface treatment of quartz template for photo-curing nanoimprint lithography |
publishDate |
2006 |
url |
http://ndltd.ncl.edu.tw/handle/50043462545556374696 |
work_keys_str_mv |
AT kuanlinli fabricationandsurfacetreatmentofquartztemplateforphotocuringnanoimprintlithography AT lǐguānlín fabricationandsurfacetreatmentofquartztemplateforphotocuringnanoimprintlithography AT kuanlinli guānggùhuàxíngnàimǐyāyìnshíyīngmǔmózhìbèijíbiǎomiànchùlǐzhīyánjiū AT lǐguānlín guānggùhuàxíngnàimǐyāyìnshíyīngmǔmózhìbèijíbiǎomiànchùlǐzhīyánjiū |
_version_ |
1718149788014215168 |