In-situ MOKE measurements of cobalt films on polycrystalline copper in diluted sulfuric acid
碩士 === 國立中正大學 === 物理所 === 95 === The formation of Co films on polycrystalline copper in diluted sulphuric acid was investigated by cyclic voltammetry (CV) and in-situ magneto-optic Kerr effect (MOKE) measurements. We present the design of our home-built cell for these measurements. The sample prepar...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/40836558915137601894 |
| Summary: | 碩士 === 國立中正大學 === 物理所 === 95 === The formation of Co films on polycrystalline copper in diluted sulphuric acid was investigated by cyclic voltammetry (CV) and in-situ magneto-optic Kerr effect (MOKE) measurements. We present the design of our home-built cell for these measurements. The sample preparation was controlled by ex-situ atomic force microscopy (AFM) measurements, where we can observe a strong dependence between surface roughness and the duration of the electropolishing procedure for the sample preparation. By comparing CV measurements in the pure supporting electrolyte 11 mM K2SO4 /1 mM H2SO4 and the cobalt sulphate solution (10 mM K2SO4 /1 mM H SO4 /1 mM CoSO4 ) we can identify peaks for Co bulk deposition E = -1050 mV vs Ag/Ag2SO4 and desorption at E = -600 mV . By observing the MOKE signal for a very long time at different sample potentials a reasonable deposition rate was found for a value of E = -1050 mV. The preparation of Co films through different waiting times at E = -1080 mV shows a linear increase of the remanent Kerr intensity M and the waiting time.
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