In-situ MOKE measurements of cobalt films on polycrystalline copper in diluted sulfuric acid
碩士 === 國立中正大學 === 物理所 === 95 === The formation of Co films on polycrystalline copper in diluted sulphuric acid was investigated by cyclic voltammetry (CV) and in-situ magneto-optic Kerr effect (MOKE) measurements. We present the design of our home-built cell for these measurements. The sample prepar...
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ndltd-TW-095CCU051980242015-10-13T14:08:37Z http://ndltd.ncl.edu.tw/handle/40836558915137601894 In-situ MOKE measurements of cobalt films on polycrystalline copper in diluted sulfuric acid 結合表面磁光柯爾效應量測與電化學方法研究Co/Cu(多晶)薄膜之物性 Hung-sheng Pai 白鴻陞 碩士 國立中正大學 物理所 95 The formation of Co films on polycrystalline copper in diluted sulphuric acid was investigated by cyclic voltammetry (CV) and in-situ magneto-optic Kerr effect (MOKE) measurements. We present the design of our home-built cell for these measurements. The sample preparation was controlled by ex-situ atomic force microscopy (AFM) measurements, where we can observe a strong dependence between surface roughness and the duration of the electropolishing procedure for the sample preparation. By comparing CV measurements in the pure supporting electrolyte 11 mM K2SO4 /1 mM H2SO4 and the cobalt sulphate solution (10 mM K2SO4 /1 mM H SO4 /1 mM CoSO4 ) we can identify peaks for Co bulk deposition E = -1050 mV vs Ag/Ag2SO4 and desorption at E = -600 mV . By observing the MOKE signal for a very long time at different sample potentials a reasonable deposition rate was found for a value of E = -1050 mV. The preparation of Co films through different waiting times at E = -1080 mV shows a linear increase of the remanent Kerr intensity M and the waiting time. J.S. Tsay Chiung-Wu Su 蔡志申 蘇炯武 2007 學位論文 ; thesis 133 zh-TW |
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碩士 === 國立中正大學 === 物理所 === 95 === The formation of Co films on polycrystalline copper in diluted sulphuric acid was investigated by cyclic voltammetry (CV) and in-situ magneto-optic Kerr effect (MOKE) measurements. We present the design of our home-built cell for these measurements. The sample preparation was controlled by ex-situ atomic force microscopy (AFM) measurements, where we can observe a strong dependence between surface roughness and the duration of the electropolishing procedure for the sample preparation. By comparing CV measurements in the pure supporting electrolyte 11 mM K2SO4 /1 mM H2SO4 and the cobalt sulphate solution (10 mM K2SO4 /1 mM H SO4 /1 mM CoSO4 ) we can identify peaks for Co bulk deposition E = -1050 mV vs Ag/Ag2SO4 and desorption at E = -600 mV . By observing the MOKE signal for a very long time at different sample potentials a reasonable deposition rate was found for a value of E = -1050 mV. The preparation of Co films through different waiting times at E = -1080 mV shows a linear increase of the remanent Kerr intensity M and the waiting time.
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author2 |
J.S. Tsay |
author_facet |
J.S. Tsay Hung-sheng Pai 白鴻陞 |
author |
Hung-sheng Pai 白鴻陞 |
spellingShingle |
Hung-sheng Pai 白鴻陞 In-situ MOKE measurements of cobalt films on polycrystalline copper in diluted sulfuric acid |
author_sort |
Hung-sheng Pai |
title |
In-situ MOKE measurements of cobalt films on polycrystalline copper in diluted sulfuric acid |
title_short |
In-situ MOKE measurements of cobalt films on polycrystalline copper in diluted sulfuric acid |
title_full |
In-situ MOKE measurements of cobalt films on polycrystalline copper in diluted sulfuric acid |
title_fullStr |
In-situ MOKE measurements of cobalt films on polycrystalline copper in diluted sulfuric acid |
title_full_unstemmed |
In-situ MOKE measurements of cobalt films on polycrystalline copper in diluted sulfuric acid |
title_sort |
in-situ moke measurements of cobalt films on polycrystalline copper in diluted sulfuric acid |
publishDate |
2007 |
url |
http://ndltd.ncl.edu.tw/handle/40836558915137601894 |
work_keys_str_mv |
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