Fabrication of Photonic Crystal with Resonant Cavity on SOI wafer

碩士 === 國立中正大學 === 光機電整合工程所 === 95 === In this thesis, we utilized the finite different time domain (FDTD) and planer wave expansion (PWE) methods to simulate the band gap properties and structures of photonic crystals. By this two simulation methods, we can obtain the resonance defect modes in optic...

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Main Authors: Ting-wei Chiang, 江廷尉
Other Authors: Chia-chen Hsu
Format: Others
Language:zh-TW
Published: 2007
Online Access:http://ndltd.ncl.edu.tw/handle/41471515173579339443
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spelling ndltd-TW-095CCU056510172015-10-13T11:31:38Z http://ndltd.ncl.edu.tw/handle/41471515173579339443 Fabrication of Photonic Crystal with Resonant Cavity on SOI wafer 在SOI基板製作光子晶體共振腔 Ting-wei Chiang 江廷尉 碩士 國立中正大學 光機電整合工程所 95 In this thesis, we utilized the finite different time domain (FDTD) and planer wave expansion (PWE) methods to simulate the band gap properties and structures of photonic crystals. By this two simulation methods, we can obtain the resonance defect modes in optical communication wavelength. In the fabrication process, we use e-beam lithography technique to do the triangle air-hole 2D photonic crystals with defects on electro-resist that agreed with the simulation results. And then use reactive ion etching (RIE) to transfer the patterns into SOI wafer. Finally, remove silica between the silicon of SOI wafer by 3 wt-% HF. This method can suspend the silicon photonic crystal, and the refractive index contrast is become larger in the vertical direction. This 2D slab photonic crystal can be expected to match the photonic band gap properties with 3D photonic crystals. Chia-chen Hsu 言午佳振 2007 學位論文 ; thesis 84 zh-TW
collection NDLTD
language zh-TW
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sources NDLTD
description 碩士 === 國立中正大學 === 光機電整合工程所 === 95 === In this thesis, we utilized the finite different time domain (FDTD) and planer wave expansion (PWE) methods to simulate the band gap properties and structures of photonic crystals. By this two simulation methods, we can obtain the resonance defect modes in optical communication wavelength. In the fabrication process, we use e-beam lithography technique to do the triangle air-hole 2D photonic crystals with defects on electro-resist that agreed with the simulation results. And then use reactive ion etching (RIE) to transfer the patterns into SOI wafer. Finally, remove silica between the silicon of SOI wafer by 3 wt-% HF. This method can suspend the silicon photonic crystal, and the refractive index contrast is become larger in the vertical direction. This 2D slab photonic crystal can be expected to match the photonic band gap properties with 3D photonic crystals.
author2 Chia-chen Hsu
author_facet Chia-chen Hsu
Ting-wei Chiang
江廷尉
author Ting-wei Chiang
江廷尉
spellingShingle Ting-wei Chiang
江廷尉
Fabrication of Photonic Crystal with Resonant Cavity on SOI wafer
author_sort Ting-wei Chiang
title Fabrication of Photonic Crystal with Resonant Cavity on SOI wafer
title_short Fabrication of Photonic Crystal with Resonant Cavity on SOI wafer
title_full Fabrication of Photonic Crystal with Resonant Cavity on SOI wafer
title_fullStr Fabrication of Photonic Crystal with Resonant Cavity on SOI wafer
title_full_unstemmed Fabrication of Photonic Crystal with Resonant Cavity on SOI wafer
title_sort fabrication of photonic crystal with resonant cavity on soi wafer
publishDate 2007
url http://ndltd.ncl.edu.tw/handle/41471515173579339443
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