Study of Atmospheric Pressure Plasma Surface Treatment for ITO Glass

• Main Authors: Wesley Ho, 何憾
• Other Authors: Jurgen Liu
• Format: Others
• Language: zh-TW
• Published: 2006
• Online Access: http://ndltd.ncl.edu.tw/handle/29994931826487852809

碩士 === 義守大學 === 材料科學與工程學系碩士班 === 95 === Recently, the research and development of atmospheric pressure (AP) low-temperature plasma have become very important in the world, and there’re also many practical applications in various industries, especially for the electrical industry. Due to the manufacturing processes of the electrical industry pursues advanced techniques and low cost considerations, results in the AP plasma technology to be the candidate for surface treatment process. The study mainly focused to investigate the characteristics of ITO glass surface treatment with AP plasma system. Because LCD industry is supported and encouraged by government, so that the novel material technology development is also important and urgent. In this study, we choose the ITO and quartz glasses surface treatment to be the major research direction and adopt AP plasma system with in-line platform, corona electrode, clean dry air (CDA) and H2/Ar mixture process gases to study the characteristics variations of surface treatment. During the experimental period, we suggested to use the CDA as the plasma gas source for its extra low cost and convenience. The results indicated that the substrates treated by AP plasma system with CDA and H2/Ar mixture process gases, the treated rates of 20mm/s, resulted in great clean efficiency on ITO glasses surface. Except those, we also found the ITO glasses characteristics variations by surface treatment with AP plasma system depend on the treated gases, the power supply system, the electrode design and the initial characteristics of ITO glasses. These evolutional characteristics may also be referred to the other applications and development of ITO glasses.