| Summary: | 碩士 === 明志科技大學 === 化工與材料工程研究所 === 95 === In this study, two series of the polyimide-silica hybrid thin films, 6FDA-ODA (FS sreies) and PMDA-ODA (PS series), were synthesized by using the sol-gel method. TGA and DSC analysis showed that the pyrolysis and glass transition temperature of hybrid thin films increased with increasing the silica content. The measurement of contact angle and FTIR indicated that the hydrophilic and hydrolytic abilities were significantly improved when the silica content increased. The n&k and UV-vis specrtra showed that the refractive index could be controlled by the silica content. The hybrid films have a lower cutoff wavelengths and thus an excellent optical transparency. TEM and FTIR analysis showed that the particle size of silica in the hybrid thin films could be effectively controlled. Moreover, The results of SEM and AFM demonstrated that the polyimide-silica hybrid thin films have an excellent film formability and planarity. In this study, a were also new were photosensitive fluorinated polyimide/silica hybrid materials have successfully prepared. The novel photosensitive polyimide/silica hybrid materials could largely eliminate the evaporation of MDAE during the curing process by using the coupling agent and silica. The silica domain in the hybrid materials also significantly enhanced the thermal properties. It also exhibited a good lithographic resolution, dimensional stability, and low optical loss in NIR region. The newly prepared photosensitive materials could have potential applications for the patterned electronic and optoelectronic devices.
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