The study on the kinetics of color waterborne photo-resist

• Main Authors: Chia-Ching Lee, 李嘉慶
• Other Authors: 鄭文桐
• Format: Others
• Language: zh-TW
• Published: 2007
• Online Access: http://ndltd.ncl.edu.tw/handle/77269179032129273676

碩士 === 國立中興大學 === 化學工程學系所 === 95 === The photo-resist for color filter in liquid crystal display (LCD) was generally diluted by the solvents that has volatility and toxicity problems causing the industrial pollution. Therefore, many countries are starting to legislate against the environmental impact induced by organic solvent; and it’s an important fruition to reduce organic solvent in photo-resist by water but no affect the efficiency of photo-resist. The aim of this research is to prepare color waterborne photo-resist containing multi-acid epoxy acrylate, reactive diluents monomer, photo-initiator, organic pigment paste, and polythiol to study the reactivity of photo- polymerization of color waterborne resist through the analysis of DPC The auto-catalytic reaction model was then employed to establish the kinetics of color waterborne negative-work photo-resist as functions of organic particle size and content as well as the amounts of triethylamine, polythiol, and photo-initiator for the relationship of the photo- lithographic process with the rate constant and reaction order. In conclusion, the key results in this work can be addressed as follows: (1)The addition of excessive triethylamine would reduce the photo-reactivity of color waterborne photo- resists. (2)increasing the rate constant of photo-polymerization can reduce the film loss of color waterborne resist during development. (3)The addition of poly-thiol would overcome the screen effect caused by pigment, and increase the photo-reactivity of color waterborne photo-resists. Based on the above results, the ideal of green process on flat plate display industry would be realized.