Two-Dimensional Photonic Crystal Devices Fabricatedby Nano-Imprint Lithography
碩士 === 國立中央大學 === 電機工程研究所 === 95 === In this study, photonic crystal wavelength division multiplexer (WDM) and polarization filter based on SOI substrate have been demonstrated. The WDM is used to separate the electromagnetic wave at the wavelength of 1.55μm and 1.31μm. The polarization filter can b...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/01484942222603627441 |
| Summary: | 碩士 === 國立中央大學 === 電機工程研究所 === 95 === In this study, photonic crystal wavelength division multiplexer (WDM) and polarization filter based on SOI substrate have been demonstrated. The WDM is used to separate the electromagnetic wave at the wavelength of 1.55μm and 1.31μm. The polarization filter can be applied to leach the optical signal of TM polarization in the range of wavelength 1.3μm ~2.1μm.
We use the plane wave expansion method (PWE) to simulate the band-gap distribution of the periodical arrayed structure and used finite-differential time-domain (FDTD) method to study the steady state electromagnetic wave propagation simulation. The WDM was fabricated by e-beam lithography and polarization filter was processed by a novel technology “nano-imprint lithography” which has several extremely ascendant advantages: simple process, low production cost and high throughput efficiency.
Waveguide measurement system was used in this experiment. The measurement result shows that the performance of the WDM and the polarization filter are both good. So it means that the design of the devices structure and devices process are successful in this study. And it is expectable that more and more nano-scale devices can be fabricated by E-beam lithography and NIL process by consulting the process parameters in this study.
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