The Research on Mechanism and Control System for Micro-Anode Guided Electroplating

• Main Authors: Dong-liang Lee, 李棟樑
• Other Authors: 林景崎, 江士標
• Format: Others
• Language: zh-TW
• Published: 2007
• Online Access: http://ndltd.ncl.edu.tw/handle/48765975849364893681

博士 === 國立中央大學 === 機械工程研究所 === 95 === The purpose of the research is building the voltage and current measuring system, electrodeposition power source control system and the anode moving mechanism for the micro-anode guided electroplating, also name as MAGE. We tried to find the electroplating parameters and the proper control procedures to refine the material structure of the deposition and let its diameter to be near to the diameter of the anode. By intermittent MAGE, we can easily obtain high aspect ratio deposits, but the distance between the anode and the deposit is getting small, and the electric field strength also become higher, continuously. The target is the find the electroplating parameters that highly correlate with the distance between the anode and the deposit, and by controlling those parameters to have an uniform distribution of the electric field during electroplating and to make the deposition have a fine material structure. In this article, we disclosed the development of the MAGE control system in the last decade, including, Two-Electrode MAGE control system, Four-Electrode MAGE control system, Multi-Anode MAGE control system and Potentiostat/Galvanostat MAGE control system, and by experiments and the deposits, trying to find the parameters that affect the deposits and their influences. We found if the applied voltage is higher or the intermittent MAGE gape between electrodes is smaller, the deposition rate will be higher, but the material structure will also worse, and due to the double layer effect, the distance between the anode and the deposit is hardly obtained by only measuring the voltage and the current of the electroplating.