Characterization of AlGaN/GaN heterostructures grown by molecular beam epitaxy
碩士 === 國立中山大學 === 物理學系研究所 === 95 === In this paper we will discuss the characteristic of AlGaN/GaN heterostructure grown on sapphire by plasma-assisted molecular-beam epitaxy. In this series of samples, we try to change the ratio of buffer layer N/Al, the ratio from sample A to sample D is 43、26、23、...
Main Authors: | Yu-Chi Hsu, 徐鈺淇 |
---|---|
Other Authors: | Ikai Lo |
Format: | Others |
Language: | zh-TW |
Published: |
2007
|
Online Access: | http://ndltd.ncl.edu.tw/handle/9fapq6 |
Similar Items
-
Characterization of GaN/AlGaN heterostructures grown by molecular beam epitaxy
by: Kuang-yao Chen, et al.
Published: (2005) -
Study of Aluminum content in AlGaN/GaN heterostructures grown by molecular-beam epitaxy
by: Jui-yang Su, et al.
Published: (2008) -
Characterization of AlxGa1-xN Epilayers and AlGaN/GaN 2DEG Heterostructures Grown by Molecular Beam Epitaxy
by: Chang, Yu-Wei, et al.
Published: (2018) -
The characteristics of AlGaN/GaN heterostructure
by: Y.H.Hong, et al.
Published: (2006) -
Epitaxial Growth of AlGaN/GaN Heterostructure by Plasma-Assisted Molecular Beam Epitaxy for High Electron Mobility Transistor Applications
by: Wong, Yuen-Yee, et al.
Published: (2011)