Fabrication of nano-fin silicon wire waveguide and analysis of loss and coupling

• Main Authors: Shin-Hung Chen, 陳信宏
• Other Authors: Ming-Chang Lee
• Format: Others
• Language: zh-TW
• Published: 2007
• Online Access: http://ndltd.ncl.edu.tw/handle/40624460098240371168

碩士 === 國立清華大學 === 光電工程研究所 === 95 === Demonstrated a novel silicon wire as well as a 3-D tapered coupler can be formed simultaneously through hydrogen annealing process. We use BPM to simulate our device structure, including the mode profile and coupling efficiency of the 3-D tapered coupler. We demonstrated ultra-high vacuum annealing can be used for fabricating the silicon wire waveguide, and observed the under-cut between the Si/SiO2 interface which is also shown in hydrogen annealing. We used cut-back method to measure the propagation loss and the coupler loss in our silicon wire waveguide, and found the propagation loss and coupler loss are 1.26(dB/cm) and 2.5(dB/taper length), respectively.