ANALYSIS AND MONITORING OF MOLD CAVITY FILLING IN NANOIMPRINTING PROCESS

博士 === 國立清華大學 === 動力機械工程學系 === 95 === Nanoimprint lithography (NIL) has been recognized as one of the very promising nonphotolithographic methods for nanoscale device manufacturing. While NIL has been studied and investigated to some detail, and significant achievements of the application have been...

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Bibliographic Details
Main Authors: Ching-Chung Nien, 粘金重
Other Authors: Hong Hocheng
Format: Others
Language:en_US
Published: 2007
Online Access:http://ndltd.ncl.edu.tw/handle/48850836720793252163