ANALYSIS AND MONITORING OF MOLD CAVITY FILLING IN NANOIMPRINTING PROCESS
博士 === 國立清華大學 === 動力機械工程學系 === 95 === Nanoimprint lithography (NIL) has been recognized as one of the very promising nonphotolithographic methods for nanoscale device manufacturing. While NIL has been studied and investigated to some detail, and significant achievements of the application have been...
Main Authors: | Ching-Chung Nien, 粘金重 |
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Other Authors: | Hong Hocheng |
Format: | Others |
Language: | en_US |
Published: |
2007
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Online Access: | http://ndltd.ncl.edu.tw/handle/48850836720793252163 |
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