Deposition of ITO Thin Film by DC Arc-Discharge Ion Plating
碩士 === 國立臺北科技大學 === 製造科技研究所 === 95 === As is known that DC arc-discharge ion plating process is one of the more promising techniques for deposition of low-resistivity and high visible-transparency ITO films with high deposition speed. Besides, due to the particles and atoms are highly activated and...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/p72p7g |