| Summary: | 碩士 === 大同大學 === 材料工程學系(所) === 95 === The color filter on mantling the photo resist of the red, green, and blue colors is an important element of LCD, that becomes colorful images at eye when the source of light across the filter forms the red, green, and blue rays. If we use the inkjet technology to make the color filter it is crucial one of the technique that control the location of the drop of inkjet, and how to improve the adherence of the surface of glass matrix to the drop of inkjet. At the skill of improving the surface the active plasma is able to be uniform, as well as functional. Plasma activation treatment and polymerization can achieve high quality of adhesiveness and coverage of nanometer-scaled thin film. After plasma treatment, sample surface will be produced radicals and functional groups. That can improve the adhesion of ink. This study will combine plasma modification technique and photolithography process; plasma treatment technique and grafting polymerization technique to give sample surface hydrophilic groups. These two ways are able to improve adhesion of ink on the color filter. Glasses and Black Matrix after Perfluoromethylcyclohexane (PFMCH) plasma treatment have good surface hydrophobic property. Contact angle of photo color filter resist solution on sample raise from <10o to 50o. And then post treatment by O2 plasma and UV-light irradiated could reduce wettability of photo resist solution (contact angle <10o). Then we could find the way of how to control and apply for plasma, as well as the parameters; at the same time we wish to increase cover between glass matrix and colored materials to develop new, effective, and useful filter by the method inkjet tecknology. To solidify the color effectively, and to decrease the amount of the color, and to keep off the mix of the color, we also want to improve the yield of color filter.
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