Application of Exposure Simulation System to Reduce Isolated-Dense Bias by Using Annular Off-Axis Illumination
碩士 === 元智大學 === 電機工程學系 === 95 === As the optical lithography is pushed into the smaller feature size below the exposure wavelength, the optical proximity effect (OPE) is one of the most serious problems. The way to solve this problem is to use optical proximity correction (OPC) or phase shift mask (...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/89228645650663503131 |