Fabrication of SU8 Comb-drive Microactuator by Photoresist Sacrificial Layer

• Main Authors: Yen-Ping Chen, 陳晏平
• Other Authors: Chang Yaw-Jen
• Format: Others
• Language: en_US
• Published: 2008
• Online Access: http://ndltd.ncl.edu.tw/handle/64107940600450199971

碩士 === 中原大學 === 機械工程研究所 === 96 === Abstract Traditional electrostatic comb-drive structure is fabricated by microelectromechanical systems (MEMS) with silicon-based materials or metals. It depends on the surface micromachining to deposit or etch structural films. The process is not only complicated but also expensive. In order to reduce process costs, the major motivation of this thesis is to develop a simpler process to manufacture microstructure. Without chemical vapor deposition (CVD), electroplating process, silicon fusion bonding and polymer hot embossing, an integrated microactuator was made by the photolithography technique and sputtering process. Photoresist is widely used for making miniaturized micromechanical components. By using positive photoresist (AZ4620) as the sacrificial layer, the negative photoresist (SU8) was utilized as the structural material. This fabrication takes only two mask processes, and it is indeed helpful to improve the misalignment in exposure. The UV lithography of SU8 has more advantages: simpler processes, lower driving voltage, lower process temperature, improved sticking problem, and the most important reason – cost effective. Simulated model is created by COMSOL Multiphysics (Finite Element Method) software for microactuator. The simulated consequences showed that the displacement can be up to 6 μm. A novel research using two groups of characteristic photoresists to fabricate polymeric (Negative Photoresist, SU8) microelectrostatic comb-drive actuator has been reported.