A Study on the Optial ,Electrochromic and Electrochemical properties of RF Sputtered Electrochromic NiOx and NiVxOy for flexible Electrochromic Devices

• Main Authors: Po-Wen Chen, 陳柏文
• Other Authors: Yung-Sen Lin
• Format: Others
• Language: zh-TW
• Published: 2008
• Online Access: http://ndltd.ncl.edu.tw/handle/09372214637172983251

碩士 === 逢甲大學 === 化學工程學所 === 96 === By the way of Energy crisis and the warm of world-wide get worst seriously, the topic of energy consumption is followed. To find and develop the energy source with the material, and to save energy promotes energy efficiency in many countries.In order to save energy, the electrochromic technology applications have be a focus recently.Owing to the driving markets, the Plastic Substrate has an advantageous position, such as lightweight, thin, flexible and high impact resistance, so the motive of this study is about the flexible electrochromic devices. The advantages of nickel oxide and vanadium nickel oxide as an electrochromic (EC) material are its good contrast of transmittance and its suitable use as a secondary electrochromic film with WO3 for electro chromic devices. Comparing with others of inorganic EC materials, it is inexpensive and easy to prepare.There are many physical or chemical methods for preparing EC nickel oxide and nickel vanadium oxide film. Those methods have their own individual advantages and disadvantages. The key point for EC applications is the preparation that would be easy-to-scale-up and low cost. In this study was using electroless metal plating, one of chemical methods, to prepare the EC nickel oxide and nickel vanadium oxide. This novel method results in not only low energy consumption and low cost for production, but also easy application of a large surface area of EC film. This study discusses the electrochromic properties using the flexible electrochromic devices, PET/ITO/NiOx and PET/ITO/NiVxOy, Produced from RF magnetron sputtering , for the future production preparation. Many experiment operation parameters are manufactured by different conditions, such as the variation of O2 flow and power magnitude in different electrolyte. Used UV-visible spectrum and envelope method for checking refractive index, thickness, absorption index and extinction coefficient. Further more, use absorption index to calculate band gap in each deposition condition and compared to R & T method. The manufactured films analyze the film thickness and surface morphology by Cold Field Emission Scanning Electron Microscope, FESEM , and XRD analyze the surface chemical element and composing by X-ray Photoelectron Spectroscope, XPS, respectively. Researchers can test the optical characterization and properties , electrochemistry properties and electrochromic properties of nickel oxid and nickel vanadium oxide film by Cyclic Voltammetry, CV and Ultraviolet-Visible spectrophotometry,UV ,and then sum up the optical density difference. The best parameter of this study is as follow : Ar is 1sccm while the sputtering power is 100W and the thickness of thin film is 300nm. O2 flow has the best anti-dazzling rate when it at 0.3sccm, and its is 70% while the wavelength is at 550nm. The discolored efficiency is 90cm2/C, the ionic in-mobility x is 0.51, and the ionic out-mobility x is 0.5.