Nitridation of Titanium Films by Atmospheric-Pressure Microwave Plasma Torch
碩士 === 國立高雄應用科技大學 === 化學工程系碩士班 === 96 === Titanium nitride films were prepared by nitridation of titanium films using an atmospheric-pressure microwave plasma torch. Titanium films were deposited on glass by magnetron sputtering. After that, the nitrogen containing 0.08% hydrogen as a reactive gas w...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/77114964662078162369 |