Characteristics of nano-scaled TiVCrTaZr nitride coating prepared by DC magnetron sputtering

碩士 === 國立中興大學 === 材料科學與工程學系 === 96 === Abstract In this study, the multi -element TiVCrZrTa alloy was deposited on silicon substrate via the reactive sputtering method. Several analysis methods were introduced in order to characterization the structure and properties of the TiVCrZrTa metallic and...

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Bibliographic Details
Main Authors: Chao-Kuei Chen, 陳兆奎
Other Authors: Fuh-Sheng Shieu
Format: Others
Language:en_US
Published: 2008
Online Access:http://ndltd.ncl.edu.tw/handle/71556294326920033859