Study on Fabrication and Field Emission Properties of Sharp ZnO Nanorod Array

• Main Authors: Hung-Chuan Yen, 顏宏全
• Other Authors: 曾俊元
• Format: Others
• Language: en_US
• Published: 2008
• Online Access: http://ndltd.ncl.edu.tw/handle/62987787825129036873

碩士 === 國立交通大學 === 電子工程系所 === 96 === In recent years, nanostructures used as emitter sources of field emission display have been researched extensively. ZnO nanorods fabricated by low process temperature attract much attention specifically. But they can not be applicable to field emission display due to bad field emission properties themselves. To improve the properties, we use wet and dry etching to sharpen ZnO nanorods in this thesis. For wet etching, we use dilute acetic acid to etch the non-annealed and the annealed nanorods. For dry etching, we use argon ion to bombard nanorods. Also, to improve the properties further, two-step etching combining wet with dry etching is used to form sharper nanorods. From our results, two-step etching exhibits the best field emission properties and stability. It can reduce over twice in the work voltage so that power consumption of field emission is lowered effectively.