Study on the Application of Ni-Si-O and Ni-Si-N Nanocrystal for Nonvolatile Memory

碩士 === 國立交通大學 === 電子工程系所 === 96 ===

Bibliographic Details
Main Author: 葉睿龍
Other Authors: 羅正忠
Format: Others
Language:en_US
Published: 2007
Online Access:http://ndltd.ncl.edu.tw/handle/48948352040147153824
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spelling ndltd-TW-096NCTU54282202015-10-13T16:13:47Z http://ndltd.ncl.edu.tw/handle/48948352040147153824 Study on the Application of Ni-Si-O and Ni-Si-N Nanocrystal for Nonvolatile Memory 鎳矽氧化物與鎳矽氮化物奈米點在非揮發性記憶體應用之研究 葉睿龍 碩士 國立交通大學 電子工程系所 96 羅正忠 葉清發 2007 學位論文 ; thesis 100 en_US
collection NDLTD
language en_US
format Others
sources NDLTD
description 碩士 === 國立交通大學 === 電子工程系所 === 96 ===
author2 羅正忠
author_facet 羅正忠
葉睿龍
author 葉睿龍
spellingShingle 葉睿龍
Study on the Application of Ni-Si-O and Ni-Si-N Nanocrystal for Nonvolatile Memory
author_sort 葉睿龍
title Study on the Application of Ni-Si-O and Ni-Si-N Nanocrystal for Nonvolatile Memory
title_short Study on the Application of Ni-Si-O and Ni-Si-N Nanocrystal for Nonvolatile Memory
title_full Study on the Application of Ni-Si-O and Ni-Si-N Nanocrystal for Nonvolatile Memory
title_fullStr Study on the Application of Ni-Si-O and Ni-Si-N Nanocrystal for Nonvolatile Memory
title_full_unstemmed Study on the Application of Ni-Si-O and Ni-Si-N Nanocrystal for Nonvolatile Memory
title_sort study on the application of ni-si-o and ni-si-n nanocrystal for nonvolatile memory
publishDate 2007
url http://ndltd.ncl.edu.tw/handle/48948352040147153824
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