Reversible Photoinduced Effects in Nonvolatile Memory Device Based on Hafnium-silicate Dielectric

碩士 === 國立交通大學 === 顯示科技研究所 === 96 === This work describes the memory effect in pentacene-based organic thin-film transistors (OTFTs) with a high-dielectric gate insulator, hafnium silicate, which is a suitable material for the trapped-induced effect due to its dual-phase structure consisting of the a...

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Bibliographic Details
Main Authors: Hsiao-Fen Chang, 張曉芬
Other Authors: Fang-Chung Chen
Format: Others
Language:en_US
Published: 2008
Online Access:http://ndltd.ncl.edu.tw/handle/85554704465643683872

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